Lithographic apparatus and device manufacturing method

Radiant energy – Inspection of solids or liquids by charged particles – Electron microscope type

Reexamination Certificate

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C250S310000, C248S550000

Reexamination Certificate

active

07049592

ABSTRACT:
A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.

REFERENCES:
patent: 5508518 (1996-04-01), Kendall
patent: 6036162 (2000-03-01), Hayashi
patent: 6222614 (2001-04-01), Ohtomo
patent: 6285444 (2001-09-01), Osanai et al.
patent: 6750625 (2004-06-01), Binnard et al.
patent: 2003/0197914 (2003-10-01), Cox et al.
patent: 2004/0065847 (2004-04-01), Franken et al.
patent: 1 081 521 (2001-03-01), None
patent: 1 220 037 (2002-07-01), None
patent: 1 237 044 (2002-09-01), None

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