Lithographic apparatus and cleaning method therefor

Details Lithographic apparatus and cleaning method therefor Lithographic apparatus and cleaning method therefor

2006-06-13

2009-10-06

Souw, Bernard E (Department: 2881)

Radiant energy

Irradiation of objects or material

C250S50400H, C216S067000, C134S001100, C156S345350, C257SE21245, C427S533000, C427S534000, C427S569000, C427S595000

Reexamination Certificate

active

07598503

ABSTRACT:
A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.

REFERENCES:
patent: 4361461 (1982-11-01), Chang
patent: 5306348 (1994-04-01), Fleischer et al.
patent: 5607602 (1997-03-01), Su et al.
patent: 5885361 (1999-03-01), Kikuchi et al.
patent: 6566667 (2003-05-01), Partlo et al.
patent: 6815633 (2004-11-01), Chen et al.
patent: 7166816 (2007-01-01), Chen et al.
patent: 7172792 (2007-02-01), Wang et al.
patent: 7196342 (2007-03-01), Ershov et al.
patent: 7462850 (2008-12-01), Banine et al.
patent: 2002/0084425 (2002-07-01), Klebanoff et al.
patent: 2003/0043456 (2003-03-01), Singh
patent: 2004/0007246 (2004-01-01), Chan et al.
patent: 2004/0011381 (2004-01-01), Klebanoff et al.
patent: 2005/0122593 (2005-06-01), Johnson
patent: 2006/0086699 (2006-04-01), Holber et al.
patent: 2006/0278833 (2006-12-01), Wilhelmus Van Herpen et al.
patent: 2006/0289811 (2006-12-01), Wilhelmus Van Herpen et al.
patent: 2007/0125964 (2007-06-01), Van Herpen et al.
patent: 2007/0131878 (2007-06-01), Banine et al.
patent: 2007/0145018 (2007-06-01), Smith et al.
patent: 2007/0145295 (2007-06-01), Banine et al.
patent: 2007/0212864 (2007-09-01), Vitale
patent: 2008/0074655 (2008-03-01), Wilhelmus Van Herpen et al.
patent: 2009/0072168 (2009-03-01), Banine et al.
patent: 1065568 (2001-01-01), None
patent: WO 2005/010617 (2005-02-01), None
“Passivation-Wikipedia”, <http://en.wikipedia.org/wiki/Passivation> dated May 17, 2004.
“Material—Silicon Nitride Properties”, <www.accuratus.com/silinit.html> dated Nov. 2, 2002.
Grubbs & George, “Attenuation of hydrogen radicals traveling under flowing gas condition through tubes of different materials”, J. Vac. Sci. Technol. A 24(3), 2006, 486-496.
International Search Report and Written Opinion issued for PCT Patent Application No. PCT/NL2006/000291, dated Jan. 25, 2007.
European Examination Report issued on Jan. 20, 2009 in European Application No. 06 747 569.9.

Affiliated with

Also associated with

Rating

Lithographic apparatus and cleaning method therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus and cleaning method therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and cleaning method therefor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4115551