Lithographic apparatus and apparatus adjustment method

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C250S492200, C250S492100

Reexamination Certificate

active

07078715

ABSTRACT:
A lithographic projection apparatus includes a beam production system for projecting a patterned beam of radiation onto a target portion of a substrate, and a support table for supporting an article. The support table has a support surface and an array of protrusions extending from the support surface to support the article on the protrusions. The apparatus also includes a detector for detecting height deviations of the protrusions that affect a surface flatness of the article, a height adjustment device arranged to independently modify a height of the individual protrusions when the support table is operable in the apparatus, and a controller coupled between the detector and the height adjustment device and arranged to control the height adjustment device to adjust the height of the protrusions corresponding to the detected height deviations of the protrusions that affect the surface flatness of the article.

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patent: 5643472 (1997-07-01), Engelsberg et al.
patent: 6392738 (2002-05-01), van de Pasch et al.
patent: 6556281 (2003-04-01), Govil et al.
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patent: 0480616 (1992-04-01), None
patent: 0480616 (1992-09-01), None
patent: 1 229 575 (2002-08-01), None
patent: 1 229 575 (2002-08-01), None
European Search Report for Appln. No. 03077530.8, dated Jul. 9, 2004.

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