Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1991-06-07
1993-03-16
Dang, Thi
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156656, 156657, 156667, 65 301, 65 3013, 65 31, C03C 1500, C03C 2100
Patent
active
051941171
ABSTRACT:
Oxides of tantalum and niobium are selectively etched using patterned silicon oxide deposited by a low-temperature chemical vapor deposition as a mask and a sulfate flux to selectively remove exposed portions of the tantalum or niobium oxide substrate.
REFERENCES:
patent: 4094677 (1978-06-01), Weirauch
patent: 4284663 (1981-08-01), Carruthers et al.
patent: 4598039 (1986-07-01), Fischer et al.
patent: 4838989 (1989-06-01), Ashby et al.
Bindell Jeffrey B.
Cargo James T.
Holmes Ronald J. A.
Hughes Michael C.
AT&T Bell Laboratories
Dang Thi
Laumann R. D.
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