Liquid supply apparatus

Details Liquid supply apparatus Liquid supply apparatus

1992-12-10

1994-01-04

Simmons, David A.

Coating apparatus

Projection or spray type

With projector heating, cleaning or conditioning

118 52, 118 56, 118321, 118203, 427425, B05C 500

Patent

active

052756580

ABSTRACT:
A developer-supply apparatus has a developer-liquid supply nozzle, a spin chuck for supporting a wafer, and a holder for allowing the supply nozzle to wait there. The supply nozzle is transferred between a position above the chuck and a waiting position on the holder. The supply nozzle has a nozzle tip with a plurality of through holes communicating with a space containing a developer liquid. A U-shaped conduit extending along the line of the through holes is provided in the holder, for removing drops of the developer liquid hanging from the nozzle tip. The conduit has a bottom provided with a plurality of through holes for exhausting the developer liquid.

REFERENCES:
patent: 4190015 (1980-02-01), Hillman
patent: 4886012 (1989-12-01), Ikeno et al.
patent: 5002008 (1991-03-01), Ushijima et al.
patent: 5089305 (1992-02-01), Ushijima et al.
patent: 5116250 (1992-05-01), Sago et al.

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