Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1991-08-15
1993-06-08
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430271, 430277, 430281, 430325, 430910, G03C 172, G03F 7028, G03F 7033
Patent
active
052178471
ABSTRACT:
Disclosed is a UV-curable, aqueous developable liquid solder mask composition comprising (1) 40%-70% of a nonreactive binder that is a film-forming random copolymer of (a) one or more (meth)acrylic alkyl ester monomers, at least one of which is an ester of a 4-12 carbon alkanol, (b) acrylic or methacrylic acid, and optionally (c) styrene or .alpha.-methylstyrene, (2) 20%-40% of one or more (meth)acrylic ester monomers containing two or more ethylenic double bonds, wherein at least one of the monomers has at least four ethylenic double bonds, (3) 1%-5% of a free radical-generating photoinitiator, (4) 5%-15% of a filler, all percentages being by weight based on the nonsolvent components of the composition, and (5) an organic solvent.
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Bowers Jr. Charles L.
Chu John S.
Hercules Incorporated
Patterson Joanne W.
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