Liquid processing apparatus and liquid processing method

Details Liquid processing apparatus and liquid processing method Liquid processing apparatus and liquid processing method

2006-02-24

2009-02-24

Norton, Nadine (Department: 1792)

Cleaning and liquid contact with solids

Processes

Hollow work, internal surface treatment

C134S022170, C134S001200, C134S001300, C134S026000, C134S133000, C216S028000, C438S689000

Reexamination Certificate

active

07493904

ABSTRACT:
A liquid processing apparatus comprises a liquid processing section for applying a liquid processing to wafers W, a carrier delivery section for delivering the carrier housing the wafers W, a carrier stock section capable of storing a plurality of carriers, an interface section for transferring the wafers W between the carrier stock section and the liquid processing section, a carrier transfer device for transferring the carrier, a wafer inspecting device for inspecting the wafers W within the carrier, and a carrier transfer device control section for controlling the carrier transfer device. The carrier transfer device control section controls the carrier transfer device such that the carrier, which has been judged to be capable of a liquid processing on the basis of the result of the inspection of the wafers W, is stored in the carrier stock section, and the liquid processing is started after completion of the inspection of a predetermined number of carriers.

REFERENCES:
patent: 6009890 (2000-01-01), Kaneko et al.
patent: 6051349 (2000-04-01), Yoshioka et al.
patent: 6203627 (2001-03-01), Shindo et al.

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