Liquid-phase epitaxy growth system and method for growing epitax

Details Liquid-phase epitaxy growth system and method for growing epitax Liquid-phase epitaxy growth system and method for growing epitax

1994-04-28

1996-01-09

Warden, Robert J.

Coating apparatus

Immersion or work-confined pool type

Work-confined pool

118415, 117 57, H01L 21208, C30B 1906

Patent

active

054825555

ABSTRACT:
A liquid-phase epitaxy system having an LPE boat which consists of a slider section, a source holder section, and a contacting well section, in which the distance between the first two contacting wells is different from that between the first two source holding wells, so that the concentration of the solutions can be controlled by a proper temperature profile, since the solution for melt-etching and the remaining solution for the epitaxial growth are not deposited into the contact wells at the same time. This permits in-situ melt-etching and improvement in the quality of the epitaxial layer and the epitaxial yield by minimizing the contamination of the melt-etched surface of the substrate.

REFERENCES:
patent: 3753801 (1973-08-01), Lockwood et al.
patent: 3767481 (1973-10-01), Ettenberg et al.
patent: 4357897 (1982-11-01), Lewsin
patent: 4470368 (1984-09-01), Reynolds, Jr.

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