Radiant energy – Ion generation – Field ionization type
Reexamination Certificate
2007-04-04
2008-09-02
Souw, Bernard E (Department: 2881)
Radiant energy
Ion generation
Field ionization type
C250S43200R, C250S492210, C250S492300, C315S111310, C315S111810
Reexamination Certificate
active
07420181
ABSTRACT:
An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion sour source, if back-sputtered particles attach to the Ga liquid metal ion source, contamination which may change physical characteristics of Ga9 does not occur. A W aperture is used as a beam limiting (GUN) aperture to place Ga of approx. 25 mg (of melting point of 30° C.) on a surface of a portion included in a beam emission region (Ga store). When emitting ions to the beam limiting (GUN) aperture, Ga in the emission region melts and diffuses on a surface of the beam emission region of the W aperture.
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Luginsland, J., “Beyond the Child-Langmuir Law: The Physics of Multi-dimensional Space-Charge-Limited Emission” <http://flux.aps.org/meetings/YR01/DPP01/abs/S1320002.html>.
Ishitani Tohru
Izawa Shigeru
Kaga Hiroyasu
Madokoro Yuichi
Umemura Kaoru
Hitachi High-Technologies Corporation
McDermott Will & Emery LLP
Souw Bernard E
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