Liquid delivery system

Details Liquid delivery system Liquid delivery system

1998-03-31

2000-08-01

Bueker, Richard

Coating apparatus

Gas or vapor deposition

137606, C23C 1600

Patent

active

060961341

ABSTRACT:
The invention relates to an apparatus and process for the vaporization of liquid precursors and deposition of a film on a suitable substrate. Particularly contemplated is an apparatus and process for the deposition of a metal-oxide film, such as a barium, strontium, titanium oxide (BST) film, on a silicon wafer to make integrated circuit capacitors useful in high capacity dynamic memory modules.

REFERENCES:
patent: 5000113 (1991-03-01), Wang et al.
patent: 5204314 (1993-04-01), Kirlin et al.
patent: 5376409 (1994-12-01), Kaloyeros
patent: 5419924 (1995-05-01), Nagashima et al.
patent: 5630878 (1997-05-01), Miyamoto et al.
patent: 5660201 (1997-08-01), Turner
patent: 5840254 (1998-11-01), Carver, Jr. et al.
patent: 5865421 (1999-02-01), Ono
U.S. application No. 08/749,613, Fairbairn filed Nov. 18, 1996.
U.S. application No. 08/927,700, Somekh et al., filed Sep. 11, 1997.
U.S. application No. 09/052,743, Sajoto et al., filed Mar. 31, 1998.
U.S. application No. 09/052,763, Zhao et al., filed Mar. 31, 1989.
U.S. application No. 09/052,765, Zhao et al., filed Mar. 31, 1998.
U.S. application No. 09/052,766, Sajoto et al., filed Mar. 31, 1998.
U.S. application No. 09/052,767, Dornfest et al., filed Mar. 31, 1998.
U.S. application No. 09/052,792, Sajoto et al., filed Mar. 31, 1998.
U.S. application No. 09/052,885, Sajoto et al., filed Mar. 31, 1998.

Affiliated with

Also associated with

Rating

Liquid delivery system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Liquid delivery system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Liquid delivery system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-660031