Liquid crystal cells – elements and systems – Particular structure – Having significant detail of cell structure only
Reexamination Certificate
2011-07-05
2011-07-05
Dudek, James A (Department: 2871)
Liquid crystal cells, elements and systems
Particular structure
Having significant detail of cell structure only
Reexamination Certificate
active
07973905
ABSTRACT:
A passivation layer is formed by coating a flowable insulating material on the substrate where a thin film transistor and a storage capacitor electrode, and a pixel electrode is formed on the passivation layer. A portion of the passivation layer is etched using the pixel electrode as a mask to make a groove on the thin film transistor, and then a black matrix is formed by filling an organic black photoresist in the groove. To increase the storage capacitance, a portion of the passivation layer is removed or to form a metal pattern on the storage capacitor electrode. A flowable insulating material is used as a gate insulating layer to planarize the substrate. In the case of the etch stopper type thin film transistor, a photo definable material is used as the etch stopper layer to reduce the parasitic capacitance between the gate electrode and the drain electrode.
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Lee Jung-Ho
Rho Soo-Guy
Dudek James A
F. Chau & Associates LLC
Samsung Electronics Co,. Ltd.
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