Liquid crystal display substrate fabrication

Details Liquid crystal display substrate fabrication Liquid crystal display substrate fabrication

2007-05-01

2007-05-01

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C430S319000, C430S394000

Reexamination Certificate

active

10723491

ABSTRACT:
In order to prevent exposure mismatch on a boundary between exposure regions that causes pattern connection defects (including stitch defects), exposure is performed twice or more on a whole exposure region of a glass substrate. The exposure method includes aligning a reticle in a scanning direction, exposing the reticle pattern onto the glass substrate, moving the glass substrate one-half of the width of the reticle, and exposing an exposure area twice by repeating the exposing and moving steps.

REFERENCES:
patent: 5437946 (1995-08-01), McCoy
patent: 5888676 (1999-03-01), Saitoh
patent: 6204912 (2001-03-01), Tsuchiya et al.
patent: 6288772 (2001-09-01), Shinozaki et al.
patent: 6444399 (2002-09-01), Nakasuji
patent: 6577366 (2003-06-01), Kim et al.
patent: 6583854 (2003-06-01), Hazama et al.

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