Liquid crystal display device and fabricating method...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step

Reexamination Certificate

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C438S699000, C438S942000, C438S946000, C257SE21023

Reexamination Certificate

active

07425508

ABSTRACT:
A liquid crystal display device, including: a gate line on a substrate; a data line crossing the gate line with a gate insulating film therebetween to define a pixel area; a thin film transistor connected to the gate line and the data line; a semiconductor pattern which forms a channel of the thin film transistor and overlaps along the data line; a passivation film covering the data line and the thin film transistor; and a pixel electrode on the gate insulating film in a pixel hole of the pixel area that penetrates the passivation film and connected to the thin film transistor, the pixel electrode on an inclined side surface of the passivation film to encompass the pixel hole, to form a border with the passivation film and having a thickness that decreases as it goes up the side surface of the passivation film.

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