Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1999-06-11
2000-10-24
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
526237, G03F 711
Patent
active
06136505&
ABSTRACT:
Disclosed herein is a liquid coating composition for use in forming an antireflective film comprising a mixture of a cyclic perfluoroalkyl polyether and a chain perfluoroalkyl polyether in a ratio of from 3:10 to 10:1 by weight, and a fluorocarbon organic solvent. Disclosed also herein is a photoresist material consisting of a photoresist layer and said antireflective film formed thereon using said liquid coating composition. The antireflective film remarkably reduces the standing-wave effect especially in the case where the photoresist layer of chemically amplified type is used. The antireflective film also has good film quality and film removability.
REFERENCES:
patent: 5136002 (1992-08-01), Sugimori et al.
patent: 5155796 (1992-10-01), Oonishi et al.
patent: 5965294 (1999-10-01), Hamada
Kobayashi Masakazu
Komano Hiroshi
Nakayama Toshimasa
Tanabe Masahito
Wakiya Kazumasa
Hamilton Cynthia
Tokyo Ohka Kogyo Co. Ltd.
LandOfFree
Liquid coating composition for use in forming antireflective fil does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Liquid coating composition for use in forming antireflective fil, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Liquid coating composition for use in forming antireflective fil will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1961913