Liquid coating composition for forming a top antireflective...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S270100

Reexamination Certificate

active

07129020

ABSTRACT:
Disclosed is a liquid coating composition for forming a top antireflective film that contains a polymer, the polymer containing, as a structural unit, a (meth)acrylate unit that has at least one polycyclic hydrocarbon group on its side chain and becomes more soluble to alkali by the action of an acid, the liquid coating composition comprising: (a) a water-soluble, film-forming component; (b) at least one fluorine-based compound selected from a perfluoroalkylcarboxylic acid having 4 or more carbon atoms and a perfluoroalkylsulfonic acid having 5 or more carbon atoms; and (c) a fluoroalkylsulfonic acid having 1–4 carbon atoms and/or an acidic compound consisting of a hydrocarbon having 1–4 carbon atoms in which one or more hydrogen atoms are substituted with a fluoloalkylsulfonyl group(s), with the proviso that one or more carbon atoms therein may be substituted with a nitrogen atom(s).

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patent: 5853471 (1998-12-01), Yoshida et al.
patent: 6027856 (2000-02-01), Nozaki et al.
patent: 6309789 (2001-10-01), Takano et al.
patent: 6692892 (2004-02-01), Takano et al.
patent: 1272864 (2000-11-01), None

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