Liquid apply, aqueous processable photoresist compositions

Details Liquid apply, aqueous processable photoresist compositions Liquid apply, aqueous processable photoresist compositions

1991-02-13

1991-12-10

Brammer, Jack

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430271, 430302, 430326, 430910, 522 31, 522 32, 522153, G03C 1492

Patent

active

050717308

ABSTRACT:
A new polymer family is shown for use in high sensitivity, high resolution photoresists. A liquid apply resist includes a polymer binder of t-butyl methacrylate/methylmethacrylate/methacrylic acid and an initiator which generates acid upon exposure to radiation.

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patent: 4345020 (1982-08-01), Yoneda et al.
patent: 4361640 (1982-11-01), Pine
patent: 4710446 (1987-12-01), Hoffmann et al.

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