Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Patent
1997-05-28
1999-06-29
Kopec, Mark
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
510176, 510407, 510412, 510413, 134 13, 134 26, C11D 343, C23G 502
Patent
active
059168587
ABSTRACT:
A method for washing metal masks using a cleaning liquid includes the steps of washing the metal masks before a solder printing process on printed circuit boards, washing the metal masks at least once during the solder printing process and washing the metal masks after completing the last solder printing process. The washing liquid has a composition consisting of from 1 to 5% by weight of a fluorine-based surfactant and from 95 to 99% by weight of isopropyl alcohol, the some of the constituents being 100% by weight. More preferably, the cleaning liquid is a composition consisting of 2% by weight of the fluorine-based surfactant and 98% by weight of isopropyl alcohol, the some of the constituents being 100% by weight.
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McCutcheon's, vol. 1: Emulsifiers & Detergents, North American Edition, p. 83, #-97.
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# Month not available.
Kim Choul-su
Kim Woo-Sig
Tsukue Masaharu
Bushnell Esq. Robert E.
Kopec Mark
Samsung Electronics Co,. Ltd.
Webb Gregory E.
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