Linewidth control apparatus and method

Details Linewidth control apparatus and method Linewidth control apparatus and method

1997-06-19

1998-07-14

Dutton, Brian

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Electrical characteristic sensed

438 18, H01L 2100

Patent

active

057803161

ABSTRACT:
Linewidth control features having integral transistors are disclosed. Optical and electrical measurements of the linewidth control feature and its associated transistor may be correlated thereby providing a method of improving production processes.

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Wolf et al., Silicon Processing for the VLSI Era, vol. 1, pp. 447-458, 1986.
Kerf Test Structure Designs for Process and Device Characterization C. Alcorn, D.Dworak, N. Haddad, W. Henley and P. Nixon vol. 28, No. 5, May 1985 Washington US. pp. 229-235. p. 231, col. 1, paragraph 5.
IBM Technical Disclosure Bulletin, vol. 23, No. 5, Oct. 1980 New York US, pp. 1963-1968. D. Basire Resistance and Dimension Characterization via Kerf Automatic In-Line Tests.

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