Liner for use in processing chamber

Details Liner for use in processing chamber Liner for use in processing chamber

2006-10-03

2006-10-03

Maust, Timothy L. (Department: 3751)

Fluent material handling, with receiver or receiver coacting mea

Processes

With material treatment

C141S001000, C141S085000, C141S098000, C118S715000, C156S345480

Reexamination Certificate

active

07114532

ABSTRACT:
A container for use in a processing chamber to lessen the amount of contaminant particles found within the chamber after processing. The container fits closely within the chamber and includes ports for a gas conduit and a vacuum conduit. The container may be locked to the chamber through a locking mechanism and a recess in the container. The container may be guided into the chamber with a plurality of chamfers. The container may be used in inductively coupled plasma chambers, electron cyclotron resonance chambers, and chambers capable of receiving microwaves.

REFERENCES:
patent: 4532970 (1985-08-01), Tullis et al.
patent: 4739882 (1988-04-01), Parikh et al.
patent: 5444923 (1995-08-01), Romm et al.
patent: 5527390 (1996-06-01), Ono et al.
patent: 5586585 (1996-12-01), Bonora et al.
patent: 5607276 (1997-03-01), Muka et al.
patent: 5628683 (1997-05-01), Gentischer
patent: 5752796 (1998-05-01), Muka
patent: 5772770 (1998-06-01), Suda et al.
patent: 5772946 (1998-06-01), Kaminaga et al.
patent: 5810062 (1998-09-01), Bonora et al.
patent: 5879458 (1999-03-01), Roberson, Jr. et al.
patent: 5992346 (1999-11-01), Straemke
patent: 6042651 (2000-03-01), Roberson et al.
patent: 6070599 (2000-06-01), Ghanayem et al.
patent: 6234219 (2001-05-01), Donohoe
patent: 6374871 (2002-04-01), Donohoe
patent: 6739360 (2004-05-01), Donohoe

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