Line width check in layout database

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

07055115

ABSTRACT:
A method of performing a design rule check on an integrated circuit includes tagging at least one line in a schematic with a width marker and an associated width parameter, extracting the line width marker and the associated line width parameter, comparing the extracted line width parameter with an actual design width for a design line, and generating an error condition when the actual design line width is less than the line width parameter.

REFERENCES:
patent: 5706295 (1998-01-01), Suzuki
patent: 5963729 (1999-10-01), Aji et al.
patent: 6038020 (2000-03-01), Tsukuda
patent: 6038383 (2000-03-01), Young et al.
patent: 6078737 (2000-06-01), Suzuki
patent: 6115546 (2000-09-01), Chevallier et al.
patent: 6295627 (2001-09-01), Gowni et al.
patent: 6425113 (2002-07-01), Anderson et al.
patent: 6470477 (2002-10-01), Scott
patent: 6516451 (2003-02-01), Patin
patent: 6546540 (2003-04-01), Igarashi et al.
patent: 2005/0132306 (2005-06-01), Smith et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Line width check in layout database does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Line width check in layout database, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Line width check in layout database will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3540387

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.