Line edge and size definition in e-beam exposure

Details Line edge and size definition in e-beam exposure Line edge and size definition in e-beam exposure

1996-11-05

1998-09-15

Gordon, Paul P.

Boots, shoes, and leggings

364488, 364489, 364490, 347120, 347122, G06F 1900, G06G 764, G06G 766

Patent

active

058088920

ABSTRACT:
An e-beam processing method for improving micron and submicron line quality and resolution by selecting one of several recipes each containing recursive expressions for evaluating figure pattern fracturing and e-beam processing parameters based on the size of the figure's width.

REFERENCES:
patent: 3922546 (1975-11-01), Livesay
patent: 4022927 (1977-05-01), Pfeiffer et al.
patent: 4084095 (1978-04-01), Wolfe
patent: 4370554 (1983-01-01), Bohen et al.
patent: 4833621 (1989-05-01), Umatate
patent: 5262651 (1993-11-01), Frazier et al.
patent: 5393988 (1995-02-01), Sakamoto
patent: 5432714 (1995-07-01), Chung et al.

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