Limp-stream method for selectively etching integral cathode subs

Details Limp-stream method for selectively etching integral cathode subs Limp-stream method for selectively etching integral cathode subs

1982-04-29

1983-03-08

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 156642, 156656, C23F 102

Patent

active

043760090

ABSTRACT:
In a method for preparing an integral cathode substrate and support in which selected surface portions of a formed metal part are masked, the unmasked surface portions etched, and then the mask removed, the improvement wherein the etching step is conducted by alternately directing a solid limp stream of liquid etchant into and out of contact with the part while permitting the liquid etchant to drain away from the part by gravity.

REFERENCES:
patent: 2905539 (1959-09-01), Bowerman
patent: 3432900 (1969-03-01), Kerstetter
patent: 3510372 (1970-05-01), Hoornstra
patent: 3861981 (1975-01-01), Loo
patent: 3986911 (1976-10-01), Lerner
patent: 4021279 (1977-05-01), Hirs
RCA Technical Notes, TN No. 1159, mailed Jul. 23, 1976, One-Piece Bimetal Cathode Cup and Sleeve by J. C. Turnbull.
U.S. Patent Application Serial No. 210,246 filed Nov. 25, 1980 by W. R. Poff et al., currently pending.

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