Light-sensitive recording materials for producing mar-resistant

Details Light-sensitive recording materials for producing mar-resistant Light-sensitive recording materials for producing mar-resistant

1989-02-24

1991-02-19

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 430307, 430961, 522102, 522101, 522100, G03F 7028, G03F 7033, G03F 7037

Patent

active

049943480

ABSTRACT:
A light-sensitive recording material for the production of intaglio printing plates comprises a photopolymerizable and/or photocrosslinkable material which is soluble or dispersible in a developer liquid and on exposure to actinic light is rendered insoluble or no longer dispersible in this developer liquid and which, at least in a surface zone of the surface of the layer which forms the later surface of the printing plate, contains finely divided abrasive particles whose average particle size is within the range from 0.1 to 6 .mu.m, which have a hardness of >4.0 on the Mohs hardness scale, the surface of the layer which forms the later surface of the printing plate has a peak-to-valley height of <2 .mu.m, and the photocrosslinkable and/or photopolymerizable material contains a reaction product of a cycloaliphatic epoxy with acrylic acid or methacrylic acid.

REFERENCES:
patent: 3770602 (1973-11-01), D'Alelio
patent: 3782939 (1974-01-01), Bonham et al.
patent: 3891443 (1975-06-01), Halpern et al.
patent: 4221892 (1980-09-01), Baron et al.
patent: 4548894 (1985-10-01), Lynch et al.
patent: 4560636 (1985-12-01), Stahlhofen
patent: 4703338 (1987-10-01), Sagami et al.
Chemical Abstracts, vol. 104, No. 1882945, 1974.
Chemical Abstracts, vol. 81, entry 264743, 1974.

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