Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1977-09-13
1979-11-27
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
20415918, 20415923, 430919, 430923, 430288, G03C 168, C08F 246
Patent
active
041759710
ABSTRACT:
A light-sensitive composition comprising addition polymerizable ethylenically unsaturated double bond-containing compounds and a photopolymerization initiator comprising (1) at least one compound selected from the group consisting of benzanthrone, substituted benzanthrones (the substituents of which include halogen atoms, alkyl groups having 1 to 5 carbon atoms and alkoxy groups having 1 to 5 carbon atoms), 1,2-benzanthraquinone and substituted benzanthraquinones (substituents of which include halogen atoms, alkyl groups having 1 to 5 carbon atoms and alkoxy groups having 1 to 5 carbon atoms) and (2) at least one compound selected from the group consisting of 4,4'-di-substituted amino-benzophenones represented by the following general formula (a), p-substituted amino-benzaldehyde derivatives represented by the following general formula (b), 2-(p-substituted amino-phenyl)-1,3-dioxolanes represented by the following general formula (c), 4,4'-bis(substituted amino)-N-benzylideneanilines represented by the following general formula (d) and 2-[4-(substituted amino)cinnamoyl]naphthalenes represented by the following general formula (e): ##STR1## where R and R', which may be the same or different, each represents a methyl group or an ethyl group, and R.sup.0 represents a hydrogen atom, a hydroxy group, a --CR.sup.1 R.sup.2 R.sup.3 group, where R.sup.1, R.sup.2 and R.sup.3, which may be the same or different, each represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, or an --OR.sup.4 group, where R.sup.4 represents an alkyl group having 1 to 5 carbon atoms.
REFERENCES:
patent: Re28789 (1976-04-01), Chang
patent: 3552973 (1971-01-01), Fishman
patent: 4023973 (1977-05-01), Imaizuma et al.
patent: 4055430 (1977-10-01), Hasegawa et al.
Ikeda Tomoaki
Kondoh Syunichi
Nakao Sho
Shinozaki Fumiaki
Washigawa Yasuo
Brammer Jack P.
Fuji Photo Film Co. , Ltd.
LandOfFree
Light-sensitive photopolymerizable composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Light-sensitive photopolymerizable composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Light-sensitive photopolymerizable composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-801537