Light-sensitive photographic materials with improved antistatic

Details Light-sensitive photographic materials with improved antistatic Light-sensitive photographic materials with improved antistatic

1978-10-13

1981-04-28

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430278, 430524, 430526, 430523, 430527, 430530, 430631, G03C 178, G03C 196

Patent

active

042647070

ABSTRACT:
A photographic material comprising a light sensitive photographic layer and a support having thereon in order a layer containing alumina sol including colloidal particles and an electrolyte and a layer containing a hydrophobic polymer.

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