Light-sensitive ethylenically unsaturated materials containing b

Details Light-sensitive ethylenically unsaturated materials containing b Light-sensitive ethylenically unsaturated materials containing b

1983-04-14

1984-03-27

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 430288, 430919, 430923, 20415918, 20415923, G03C 168

Patent

active

044395159

ABSTRACT:
A light-sensitive composition comprising addition polymerizable ethylenically unsaturated double bond-containing compounds and a photopolymerization initiator comprising (1) at least one compound selected from the group consisting of benzanthrone, substituted benzanthrones (the substituents of which include halogen atoms, alkyl groups having 1 to 5 carbon atoms and alkoxy groups having 1 to 5 carbon atoms), 1,2-benzanthraquinone and substituted benzanthraquinones (substituents of which include halogen atoms, alkyl groups having 1 to 5 carbon atoms and alkoxy groups having 1 to 5 carbon atoms) and (2) at least one compound selected from the group consisting of 4,4'-di-substituted amino-benzophenones represented by the following general formula (a), p-substituted amino-benzaldehyde derivatives represented by the following general formula (b), 2-(p-substituted amino-phenyl)-1,3-dioxolanes represented by the following general formula (c), 4,4'-bis(substituted amino)-N-benzylideneanilines represented by the following general formula (d) and 2-[4-(substituted amino)cinnamoyl]naphthalenes represented by the following general formula (e): ##STR1## wherein R and R', which may be the same or different, each represents a methyl group or an ethyl group, and R.sup.0 represents a hydrogen atom, a hydroxy group, a --CR.sup.1 R.sup.2 R.sup.3 group, where R.sup.1, R.sup.2 and R.sup.3, which may be the same or different, each represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, or an --OR.sup.4 group, where R.sup.4 represents an alkyl group having 1 to 5 carbon atoms.

REFERENCES:
patent: 3661588 (1972-05-01), Chang
patent: 4023973 (1977-05-01), Imaizumi et al.
patent: 4255513 (1981-05-01), Laridon et al.
patent: 4289843 (1981-09-01), Boutle et al.
patent: 4367280 (1983-01-01), Kondo et al.

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