Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1979-03-16
1981-01-06
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
20415914, 20415922, 430311, 430322, 430918, 526316, G03C 168, C08F 800
Patent
active
042437407
ABSTRACT:
A sensitive composition comprising polymethyl isopropenyl ketone of limited molecular weight and a compound of a given general formula. The formation of a pattern of less than 1 .mu.m is made possible by employing ultraviolet rays of wave lengths of 100-350 nm in place of those of 350-450 nm utilized in conventional processes. The sensitive composition is highly sensitive to ultraviolet rays in said wave range and reproduces a fine pattern precisely.
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Wissbrum, Jour. of American Chemical Society, vol. 8, pp. 58-62, (1959).
Nagata Hideo
Nakamura Yoichi
Nakane Hisashi
Tsuda Minoru
Brammer Jack P.
Tokyo Ohka Kogyo Kabushiki Kaisha
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