Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1978-11-16
1981-10-27
Kimlin, Edward C.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
2041592, 430296, 430313, 430326, 430942, 430923, 430925, 430926, G03C 168, G03C 500
Patent
active
042974330
ABSTRACT:
The present invention relates to a method for forming ultra fine patterns on films of polymethyl isopropenyl ketone or a mixture of polymethyl isopropenyl ketone and a benzophenone compound by exposing such films to ultra violet rays in the range of from 1,000 to 3,500 A. The present invention is particularly useful for providing semiconductors having ultra fine patterns and ultra LSI's. The electric or electronic circuits for electronic or electric apparatus and equipment have been produced by wiring resistors, condensers, coils, vacuum tubes and the like necessary components. However, because of various disadvantages such as assembly requiring much time, complication of work, necessity of using large equipment, reasons or causes for errors, limitation of productivity, impossibility of reducing price or cost and the like, the present invention has been developed for printed circuit boards. However, in the present invention, such active devices as vacuum tubes, resistors, condensers, coils and the like must be fixed on printed circuit boards which have been previously finished. Therefore, although this invention has brought reduction, to some extent, in the time required for the work, complication of work, and the work capacity (scale), it can not yet be said that it has made the work miniaturized or economical. Under such circumstances, through the invention of diodes and transistors by solidification of rectification and amplifying functions in the form of germanium or silicone semiconductors, if has become possible to make the work extremely miniaturized.
REFERENCES:
patent: 4018937 (1977-04-01), Levine et al.
Shultz, Journal of Polymer Science, vol. XLVII, pp. 267-276 (1960).
Wissbrun, Journal of the American Chemical Society, 81, 58, 1959, pp. 58-62.
Levine et al., "The Interaction of 5 KeV Electrons with Polymers of Methyl Isopropenyl Ketone, " Oct. 24-26, 1973.
Kosar, "Light Sensitive Systems", Feb. 1966, pp. 139-304.
Nakamura Yoichi
Tsuda Minoru
Kimlin Edward C.
Tokyo Ohka Kogyo Kabushiki Kaisha
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