Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-04-16
2000-12-26
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430905, 430906, 4302831, 4302861, G03C 173
Patent
active
061656763
ABSTRACT:
Disclosed is a light sensitive composition containing a compound capable of generating an acid on exposure of an actinic light, a compound having a chemical bond capable of being decomposed by an acid or a compound having a group cross-linking by an acid, an infrared absorber, and a solvent mixture of a first solvent with a viscosity of 1.5 cp or more and a second solvent with a viscosity of less than 1.5 cp.
REFERENCES:
patent: 4504567 (1985-03-01), Yamamoto et al.
patent: 5106673 (1992-04-01), Effenberger et al.
patent: 5198317 (1993-03-01), Osawa et al.
patent: 5219700 (1993-06-01), Nakai et al.
patent: 5314786 (1994-05-01), Roeschert et al.
patent: 5340699 (1994-08-01), Haley et al.
patent: 5585220 (1996-12-01), Breyta et al.
patent: 5712078 (1998-01-01), Huang et al.
patent: 5728442 (1998-03-01), Noguchi et al.
patent: 5858604 (1999-01-01), Takeda et al .
patent: 5876900 (1999-03-01), Watanabe et al.
patent: 5919601 (1999-07-01), Nguyen e al.
patent: 5932392 (1999-08-01), Hirai et al.
patent: 6051361 (2000-04-01), Hattori et al.
Baxter Janet
Clarke Yvette M.
Konica Corporation
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