Light-sensitive composition containing an unsaturated monomer an

Details Light-sensitive composition containing an unsaturated monomer an Light-sensitive composition containing an unsaturated monomer an

1987-09-04

1989-05-02

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430175, 430920, 430287, 522 26, 522 63, G03C 170

Patent

active

048267538

ABSTRACT:
A light-sensitive composition containing a polymerizable compound having at least one ethylenically unsaturated group, and a photopolymerization initiator of general formula (I): ##STR1## wherein Y represents --COOR.sub.1, ##STR2## --R.sub.3 --COOR.sub.1, --R.sub.3 --CONHR.sub.1 or --NHCO--R.sub.4 (wherein R.sub.1 represents a hydrogen atom, an alkyl group, or an aryl group; R.sub.2 represents a hydrogen atom or a methyl group; R.sub.3 represents an alkylene group; R.sub.4 represents an alkyl group, an alkoxy group, an aryl group; and l and m respectively represents integers of 1 to 10.); Ar represents a phenylene, naphthylene or heterocyclic aromatic group; X represents a chlorine atom or a bromine atom; and n represents 1 or 2.
The light-sensitive composition has a good stability over time since crystallization of the photopolymerization initiator on the surface of the light-sensitive layer is inhibited.

REFERENCES:
patent: 3954475 (1976-05-01), Bonham et al.
patent: 3987037 (1976-10-01), Bonham et al.

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