Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-07-18
1999-10-12
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430920, 430916, 430921, 430922, 430926, 430947, 522 16, 522 24, 522 25, 522 26, G03F 7031
Patent
active
059653248
ABSTRACT:
A light sensitive composition and a manufacturing method of a planographic printing plate employing the same are disclosed, the composition comprising a radical generating agent and a dye represented by the following formula (1), (2) or (3): ##STR1##
REFERENCES:
patent: 4636459 (1987-01-01), Kawamura et al..
patent: 4855468 (1989-08-01), Riediker et al.
patent: 4868092 (1989-09-01), Kawabata et al.
patent: 5061605 (1991-10-01), Kawamura et al.
patent: 5445918 (1995-08-01), Doba et al.
Nakayama Noritaka
Okubo Kimihiko
Hamilton Cynthia
Konica Corporation
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