Light sensitive composition and light sensitive planographic...

Details Light sensitive composition and light sensitive planographic... Light sensitive composition and light sensitive planographic...

2006-05-09

2006-05-09

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S302000, C430S913000

Reexamination Certificate

active

07041429

ABSTRACT:
Disclosed are a light sensitive composition comprising an addition polymerizable ethylenically unsaturated monomer, a photopolymerization initiator and a polymer binder, and a light sensitive planographic printing plate material comprising a hydrophilic support, and provided thereon, the light sensitive composition, wherein the photopolymerization initiator is a trihalomethyl group-containing oxadiazole compound represented by the following formula 1 or 2,

REFERENCES:
patent: 5049479 (1991-09-01), Zertani et al.
patent: 5085974 (1992-02-01), Frass et al.
patent: 0 700 909 (1996-03-01), None
patent: 2001-66773 (2001-03-01), None
patent: 2002202595 (2002-07-01), None
patent: 2002202596 (2002-07-01), None
patent: 2002-221798 (2002-08-01), None
patent: 2002221798 (2002-08-01), None
ENglsih language machine translation of JP 202-202595.

Affiliated with

Also associated with

Rating

Light sensitive composition and light sensitive planographic... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Light sensitive composition and light sensitive planographic..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Light sensitive composition and light sensitive planographic... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3576909