Light sensitive composition and image forming material

Details Light sensitive composition and image forming material Light sensitive composition and image forming material

1998-07-27

2000-04-18

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302831, 4302861, 430193, G03C 173

Patent

active

060513616

ABSTRACT:
Disclosed is a light sensitive composition comprising a compound capable of generating an acid on exposure of actinic light, one of a compound having a chemical bond capable of being decomposed by an acid and a compound having a group cross-linking by an acid, an infrared absorber, a polymer obtained by polymerization of a polymerizable composition comprising an ethylenically unsaturated monomer having a solubility parameter (SP value) of 13 or more.

REFERENCES:
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patent: 4816375 (1989-03-01), Aoai
patent: 5153095 (1992-10-01), Kawamura et al.
patent: 5340699 (1994-08-01), Haley et al.
patent: 5723253 (1998-03-01), Higashino et al.
patent: 5919601 (1999-07-01), Nguyen et al.
patent: 5932392 (1999-08-01), Hirai et al.
Patent Abstracts of Japan, vol. 098, No. 013, Nov. 30, 1998 of JP 10 207056 A, Aug. 7, 1998.

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