Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1987-07-29
1989-06-06
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430920, 430916, 522 52, 522 63, G03C 168, G03C 160, G03C 1727, C07D25120
Patent
active
048371289
ABSTRACT:
A light-sensitive composition is herein disclosed, which comprises at least one light-sensitive s-triazine compound represented by the following general formula (I) and at least one compound having at least one ethylenically unsaturated double bond and capable of causing addition polymerization: ##STR1## wherein R.sub.1 and R.sub.2 independently represent hdyrogen atom, a substituted or unsubstituted alkyl or aryl group, or a group represented by the general formula: R.sub.5 --CO-- or N(R.sub.6) (R.sub.7)--CO-- (wherein R.sub.5 stands for a substituted or unsubstituted alkyl or aryl group; and R.sub.6 and R.sub.7 independently represent hydrogen atom or a substituted or unsubstituted alkyl or aryl group), provided that R.sub.1 and R.sub.2 may form a heterocyclic ring consisting of non-metallic atoms together with the nitrogen atom to which they are bonded; R.sub.3 and R.sub.4 represent hydrogen, a halogen, an alkyl or an alkoxyl; X and Y independently represent chlorine or bromine; and m and n are 0, 1 or 2. The light-sensitive composition has high sensitivity even after storing at a high temperature and effectively used for producing light-sensitive plates for making lithographic printing plates; proof plates for printing; films for overhead projector, intermediate print and photomasks; and photoresists.
REFERENCES:
patent: 4239850 (1980-12-01), Kita
patent: 4399211 (1983-08-01), Kondo et al.
patent: 4619998 (1986-10-01), Buhr
Chemical Abstract vol. 76, No. 21, Abstract No. 126945z, 1972.
Chemical Abstract vol. 78 (21), Abstract No. 136233w, 1973.
Abe Yukio
Aotani Yoshimasa
Higashi Tatsuji
Kawamma Kouichi
Chea Thorl
Fuji Photo Film Co. , Ltd.
Michl Paul R.
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