Light reflecting mask, exposure apparatus, and measuring method

Details Light reflecting mask, exposure apparatus, and measuring method Light reflecting mask, exposure apparatus, and measuring method

2011-08-30

2011-08-30

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

08007960

ABSTRACT:
A light reflecting mask includes a reflecting layer which is provided on a substrate and reflects light, an absorbing layer which is provided on the reflecting layer and absorbs light, a device pattern which is formed in a first region of the absorbing layer, and a reflectance measuring pattern which is formed in a second region of the absorbing layer. The reflectance measuring pattern is a diffraction grating.

REFERENCES:
patent: 6013399 (2000-01-01), Nguyen
patent: 6383888 (2002-05-01), Stirton
patent: 6650421 (2003-11-01), Magome
patent: 7084982 (2006-08-01), Yamamoto et al.
patent: 7314688 (2008-01-01), Shoki
patent: 2006/0221316 (2006-10-01), Yamamoto
patent: 2004-61177 (2004-02-01), None

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