Light emitting diodes with graded composition active regions

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal

Reexamination Certificate

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C438S024000, C438S046000, C438S047000

Reexamination Certificate

active

06955933

ABSTRACT:
A light emitting device in accordance with an embodiment of the present invention includes a first semiconductor layer of a first conductivity type having a first surface, and an active region formed overlying the first semiconductor layer. The active region includes a second semiconductor layer which is either a quantum well layer or a barrier layer. The second semiconductor layer is formed from a semiconductor alloy having a composition graded in a direction substantially perpendicular to the first surface of the first semiconductor layer. The light emitting device also includes a third semiconductor layer of a second conductivity type formed overlying the active region.

REFERENCES:
patent: 5670798 (1997-09-01), Schetzina
patent: 5810925 (1998-09-01), Tadatomo et al.
patent: 5960018 (1999-09-01), Jewell et al.
patent: 6045626 (2000-04-01), Yano et al.
patent: 6133589 (2000-10-01), Krames et al.
patent: 6515313 (2003-02-01), Ibbetson et al.
patent: 6630692 (2003-10-01), Goetz et al.
Andreas Hangleiter et al., “The Role Of Piezoelectric Fields In GaN-Based Quantum Wells”, MRS Internet J. Nitride Semiconductor Research, 3, 15 (1998), 1998-1999 The Materials Society, pp. 1-8.
Fabio Bernardini et al., “Spontaneous Polarization And Piezoelectric Constants Of III-V Nitrides”, vol. 56, No. 16, Oct. 15, 1997, The American Physical Society, 4 pages.
Tetsuya Takeuchi et al., “Determination Of Piezoelectric Fields In Strained GaInN Quantum Wells Using The Quantum-Confined Stark Effect”, Applied Physics Letters, vol. 73, No. 12, Sep. 21, 1998, American Institute of Physics, pp. 1691-1693.
S. F. Chichibu et al., “Optical Properties Of InGaN Quantum Wells”, Materials Science and Engineering B59 (199) pp. 298-306.
S. F. Chichibu et al., “Effective Band Gap Inhomogenety And Piezoelectric Field InGaN/GaN Multiquantum Well Structures”, Applied Physics Letters, vol. 73, No. 14, Oct. 5, 1998, American Institute of Physics, pp. 2006-2008.
Takashi Mukai, “Current And Temperature Dependences Of Electroluminescence Of InGaN-Based UV/Blue/Green Light-Emitting Diodes”, Japanese Journal of Applied Physics, vol. 37 (1998) Pt. 2, No. 11B pp. L1358-L1361.
Fabio Della Sala et al., “Free-Carrier Screening Of Polarization Fields In Wurtzite GaN/InGaN Laser Structures”, Applied Physics Letters, vol. 74, No. 14, Apr. 5, 1999, American Institute of Physics, pp. 2002-2004.
L. H. Peng et al., “Piezoelectric Effects In The Optical Properties Of Strained InGaN Quantum Wells”, Applied Physics Letters, vol. 74, No. 6, Feb. 8, 1999, American Institute of Physics, pp. 795-797.
W. W. Chow et al., “Quantum-Well Width Dependence Of Threshold Current Density In InGaN Lasers”, vol. 75, No. 2, Jul. 12, 1999, American Institute of Physics, pp. 244-246.
Shuji Nakamura et al., “Introduction to Nitride Semiconductor Blue Lasers and Light Emitting Diodes”, ISBN 0-7484-0836-3, 8 book pages.
Tetsuya Takeuchi et al., “Theoretical Study of Orientation Dependence of Piezoelectric Effects in Wurtzite Strained GaInN/GaN Heterostructure and Quantum Wells”, Publication Board, Japanese Journal of Applied Physics, vol. 39, Part 1, No. 2A, Feb. 2000, pp. 413-416.
Tetsuya Takeuchi et al., “Quantum-Confined Stark Effect Due to Piezoelectric Fields in GaInN Strained Quantum Wells”, Japanese Journal of Applied Physics, vol. 36, Part 2, No. 4A, Apr. 1, 1997, pp. L382-385.
K. Horino et al., “Initial Growth Stage of AlGaN Grown Directly on (0001) 6H-SiC By MOVPE”, Mat. Res. Soc. Symp. Proc. vol. 499, 1997 Materials Research Society, pp. 73-78.
Dongjin Byun et al., Optimization of the GaN-Buffer Growth on 6H-SiC(0001), Thin Solid Films 289 (1996) pp. 259-260.
Noriyuki Kiwano et al., Cross-Sectional TEM Study Of Microstructures In MOVPE GaN Films Grown On α-Al2O3With A Buffer Layer Of AlN, Journal of Crystal Growth 115 (1991), pp. 381-387.
Shuji Nakamura, “GaN Growth Using GaN Buffer Layer”, Japanese Journal of Applied Physics, vol. 30, No. 10A, Oct., 1991, pp. L1705-L1707.
H. Amano et al., “Metalorganic Vapor Phase Epitaxial Growth Of A High Quality GaN Film Using An AIN Buffer Layer”, Applied Physics Letter, vol. 48, No. 5, Feb. 3, 1986, pp. 353-355.

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