Light emitting diode having algan buffer layer and method of...

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – With lattice constant mismatch

Reexamination Certificate

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C257SE33028, C257SE33034

Reexamination Certificate

active

07994539

ABSTRACT:
The present invention relates to a light emitting diode having an AlxGa1−xN buffer layer and a method of fabricating the same, and more particularly, to a light emitting diode having an AlxGa1−xN buffer layer, wherein between a substrate and a GaN-based semiconductor layer, the AlxGa1−xN (0≦x≦1) buffer layer having the composition ratio x of Al decreasing from the substrate to the GaN-based semiconductor layer is interposed to reduce lattice mismatch between the substrate and the GaN-based semiconductor layer, and a method of fabricating the same. To this end, the present invention provides a light emitting diode comprising a substrate; a first conductive semiconductor layer positioned on the substrate; and an AlxGa1−xN (0≦x≦1) buffer layer interposed between the substrate and the first conductive semiconductor layer and having a composition ratio x of Al decreasing from the substrate to the first conductive semiconductor layer.

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Office Action issued Jan. 28, 2010 in co-pending U.S. Appl. No. 12/090,047.
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Non-final Office Action of U.S. Appl. No. 12/090,047, mailed Mar. 22, 2011.

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