Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-04-30
1999-11-09
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
525376, 5253336, 5253277, 5253313, 5253299, 5253285, 5253282, 526313, 526310, C08F 830, G08F 711, G08F 709
Patent
active
059811455
ABSTRACT:
The present invention relates to a novel polymer suitable for use as an antireflective coating or as an additive in photoresist for absorption of reflected light. The novel polymer comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The polymer is soluble in organic solvents, preferrably solvents of low toxicity, or it may be soluble in water, which may additionally contain other water miscible organic solvents.
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Dammel Ralph R.
Ding Shuji
Durham Dana L.
Khanna Dinesh N.
Lu Ping-Hung
Clariant Finance (BVI) Limited
Hamilton Cynthia
Jain Sandya
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