Light absorbent agent polymer useful for organic...

Details Light absorbent agent polymer useful for organic... Light absorbent agent polymer useful for organic...

2007-10-23

2007-10-23

Pezzuto, Helen L. (Department: 1713)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C526S271000, C526S280000, C526S284000

Reexamination Certificate

active

10963129

ABSTRACT:
Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by a variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor devices, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising a light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.

REFERENCES:
patent: 6165684 (2000-12-01), Mizutani et al.
patent: 6399269 (2002-06-01), Mizutani et al.
patent: 6835532 (2004-12-01), Jung
patent: 7033729 (2006-04-01), Jung et al.
patent: 7160668 (2007-01-01), Jung et al.

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