Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-03-06
2007-03-06
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S313000, C430S319000, C430S325000, C430S326000, C430S330000, C526S271000, C526S262000
Reexamination Certificate
active
10963316
ABSTRACT:
Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of the bottom film layer or substrate and reduce standing waves caused by variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor device, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising the light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.
REFERENCES:
patent: 4582883 (1986-04-01), de Koning et al.
patent: 6165684 (2000-12-01), Mizutani et al.
patent: 6399269 (2002-06-01), Mizutani et al.
patent: 6468659 (2002-10-01), Vohwinkel et al.
patent: 3813251 (1989-11-01), None
Chemical Abstract 112:181623—English abstract for DE 3813251 (Horacek et al).
Full English translation of Horacek et al (DE 3813251 A1) (which was cited in previous Office action), provided by PTO.
Jung Jae Chang
Kim Young-Sik
Kong Keun Kyu
Hynix / Semiconductor Inc.
Lee Sin
Marshall & Gerstein & Borun LLP
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