Light absorbent agent polymer useful for organic...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S313000, C430S325000, C430S326000, C430S316000, C430S327000, C430S330000, C430S905000, C526S271000

Reexamination Certificate

active

10962847

ABSTRACT:
Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor device, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising the light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.

REFERENCES:
patent: 3553293 (1971-01-01), Stahley et al.
patent: 6165684 (2000-12-01), Mizutani et al.
patent: 6372658 (2002-04-01), Ziger et al.
patent: 6399269 (2002-06-01), Mizutani et al.
patent: 2006/0004161 (2006-01-01), Jung et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Light absorbent agent polymer useful for organic... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Light absorbent agent polymer useful for organic..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Light absorbent agent polymer useful for organic... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3739811

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.