Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-04-25
2006-04-25
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S313000, C430S316000, C430S317000, C430S319000, C430S325000, C430S326000, C430S330000, C430S905000, C430S921000, C430S925000, C526S271000, C526S280000, C526S281000
Reexamination Certificate
active
07033729
ABSTRACT:
Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused reflection of lower film layer or substrate and reduce standing waves caused by variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor device, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising the light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.
REFERENCES:
patent: 6165684 (2000-12-01), Mizutani et al.
patent: 6399269 (2002-06-01), Mizutani et al.
patent: 6838223 (2005-01-01), Yoon et al.
patent: 2005/0084798 (2005-04-01), Jung
Jung Jae-chang
Kim Seok-kyun
Kong Keun Kyu
Hynix / Semiconductor Inc.
Lee Sin
Marshall & Gerstein & Borun LLP
LandOfFree
Light absorbent agent polymer for organic anti-reflective... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Light absorbent agent polymer for organic anti-reflective..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Light absorbent agent polymer for organic anti-reflective... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3535461