Lift-off process for patterning dichroic filters

Details Lift-off process for patterning dichroic filters Lift-off process for patterning dichroic filters

1990-02-05

1992-06-09

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Screen other than for cathode-ray tube

430321, 430322, 430325, 430326, 430329, G03F 900

Patent

active

051206226

ABSTRACT:
A lithographic lift-off process includes coating a layer of positive resist material using a dynamic dispense on top of a preexisting layer of a different positive resist material. Thereafter, patternwise exposing both layers simultaneously and developing the exposed portions of both layers for a sufficient time to provide openings in the resists wherein the dynamic dispense layer overhangs the preexisting layer.

REFERENCES:
patent: 3873313 (1975-03-01), Horst et al.
86 Surface Science, 16 (Oct. 1979) by Shimomoto et al.
Frary et al., "Lift-off Techniques for Fine Line Metal Patterning" Semiconductor International, Dec. 1981, pp. 72-88.
Kramer et al., "Design and Manufacture of a Filter Set for a Multispectral Detector" J. Imag. Tech. Oct. 1986, pp. 270-279.

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