Lift-off positive resist composition

Details Lift-off positive resist composition Lift-off positive resist composition

2008-01-15

2008-01-15

Hamilton, Cynthia (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S271100, C430S314000, C430S316000, C430S319000, C430S318000

Reexamination Certificate

active

07318992

ABSTRACT:
A lift-off positive resist composition capable of forming a fine lift-off pattern is provided. This composition comprises a base resin component (A) and an acid generator component (B) generating an acid under exposure, wherein the base resin component (A) is a silicone resin.

REFERENCES:
patent: 5691396 (1997-11-01), Takemura et al.
patent: 6670100 (2003-12-01), Hasegawa et al.
patent: 2003/0060055 (2003-03-01), Kamijima
patent: 2004/0229161 (2004-11-01), Yasunami et al.
patent: 2005/0244745 (2005-11-01), Cameron et al.
patent: 03-139650 (1991-06-01), None
patent: 04-130324 (1992-05-01), None
patent: 06-118651 (1994-04-01), None
patent: 2002-110536 (2002-04-01), None
patent: 1 643 307 (2006-04-01), None
patent: WO2004/111734 (2004-12-01), None
Ferreira et al, “Choice of amines as stabilizers for cheimcally amplified resist systems”, Proceedings of SPIE, vol. 333, Advances in Resist TEchnology and Processing XV, Will Conley, Ed, Jun. 1998, pp. 236-244.

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