Coating apparatus – Gas or vapor deposition – Work support
Patent
1993-06-09
1994-07-26
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Work support
118715, 118728, 156345, C23C 1600
Patent
active
053324439
ABSTRACT:
A substrate lifting apparatus for use in a substrate processing apparatus which includes a thermal reactor having a substrate processing chamber and a substrate support located in the chamber. The lifting apparatus consists of a generally circular shaped support with four seats formed therein; four substrate lifting elements, each having a substrate engaging end and a securing tab sized to be received in a seat; a fastener, associated with each lifting element, which secures the tab into the seat; and an adjuster, associated with each lifting element, located between the tab and the seat. When the tab is secured in the seat and the adjuster is operated, the lifting element is caused to move in a plane parallel to a plane formed through the center of the fastener and the adjuster.
REFERENCES:
patent: 5000113 (1991-05-01), Wang
Chew Sandy M.-S.
Clark Shane D.
DuBois Dale R.
Leung Cissy
Morrison Alan F.
Applied Materials Inc.
Bueker Richard
Opperman Craig P.
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