Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2005-06-28
2005-06-28
Lund, Jeffrie R. (Department: 1763)
Coating apparatus
Gas or vapor deposition
C118S733000, C029S801000, C029S234000, C029S243500, C156S345240
Reexamination Certificate
active
06911093
ABSTRACT:
A lid liner for a chemical vapor deposition chamber includes an annular portion having an inner surface for surrounding a reaction volume within the chemical deposition chamber; a mounting tab formed on an outer surface of the annular portion; and a hole formed in the mounting tab for receiving a fastener wherein the hole does not penetrate the inner surface of the annular portion.
REFERENCES:
patent: 5558717 (1996-09-01), Zhao et al.
patent: 5846332 (1998-12-01), Zhao et al.
patent: 5968379 (1999-10-01), Zhao et al.
patent: 5983906 (1999-11-01), Zhao et al.
patent: 5994678 (1999-11-01), Zhao et al.
patent: 6035101 (2000-03-01), Sajoto et al.
patent: 6050506 (2000-04-01), Guo et al.
patent: 6063441 (2000-05-01), Koai et al.
patent: 6079356 (2000-06-01), Umotoy et al.
patent: 6189482 (2001-02-01), Zhao et al.
patent: 6270859 (2001-08-01), Zhao et al.
patent: 6364949 (2002-04-01), Or et al.
patent: 6432479 (2002-08-01), Chang et al.
patent: 6491978 (2002-12-01), Kalyanam
patent: 6827815 (2004-12-01), Hytros et al.
patent: 2003/0051665 (2003-03-01), Zhao et al.
patent: 2004/0237891 (2004-12-01), Stacey et al.
Allinger Jonathan
Prather Zach
Stacey David
Fitch Even Tabin & Flannery
LSI Logic Corporation
Lund Jeffrie R.
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