Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2011-03-15
2011-03-15
Kackar, Ram N (Department: 1716)
Coating apparatus
Gas or vapor deposition
C156S345330, C156S345340
Reexamination Certificate
active
07905959
ABSTRACT:
A lid assembly for a semiconductor processing system is provided. The lid assembly generally includes a lid having first and second opposed surfaces, a plurality of controllable flow channels extending from the first and second opposed surfaces and a gas control system disposed on the first surface and operably opening and closing the channels. The gas control system includes a gas manifold disposed on the lid, at least one valve coupled to the gas manifold and adapted to control a flow through one of the flow channels, a reservoir fluidly connected to the gas manifold, and a precursor source fluidly connected to the reservoir.
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Tzu Gwo-Chuan
Umotoy Salvador P.
Applied Materials Inc.
Chandra Satish
Kackar Ram N
Patterson & Sheridan LLP
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