Lid and door for a vacuum chamber and pretreatment therefor

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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20429831, H05H 100

Patent

active

055650589

ABSTRACT:
Replaceable parts for a vacuum chamber including an aluminum lid and a quartz door and shield, are treated to clean and roughen their surfaces to increase adhesion of materials deposited thereon during substrate processing in said chamber, thereby reducing downtime of the equipment. The parts can be chemically cleaned, rinsed to remove the chemicals and dried in a first step; subjected to bead blasting to roughen the surface of the part and improve adhesion thereon of deposited material; in a succeeding step the part be cleaned ultrasonically to remove all loose particles; and in a last step the parts rinsed and dried to remove moisture, prior to packaging or using the part. A novel single-piece machined aluminum lid has an extension wall from a first surface that fits into the door of the chamber, and an overlying portion of said first surface that sealingly engages the door when the lid is closed.

REFERENCES:
patent: 3617463 (1971-11-01), Gregor et al.
patent: 4411575 (1983-10-01), Miller
patent: 4466872 (1984-08-01), Einbinder
patent: 4657616 (1987-04-01), Benzing et al.
patent: 5017439 (1991-05-01), Brar et al.
patent: 5051375 (1991-09-01), Sakata et al.
patent: 5065698 (1991-11-01), Koike
patent: 5112185 (1992-05-01), Koike
patent: 5202008 (1993-04-01), Talieh et al.
Suemitsu et al, "Application of Aluminum-Alloy Ultrahigh Vacuum System to Semiconductor Device Fabrication Process", Sixth IEEE/CHMT Interntl Electronic Mfg Technol. Symp. 1989, 26 Apr., 1989 Abstract.
EP Search Report of 13 Mar. 1995.
EP Search Report for EP 93 11 3770 dated 23 Dec., 1993.
Lee et al, "Adhesion Studies of Magnetron-Sputtered Copper Films . . . " 2194 Thin Solid Films, 185 (1990) Feb., No. 1, Lausanne, CH pp. 35-55.

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