Lens system, in particular a projection lens system for...

Optical: systems and elements – Lens – With support

Reexamination Certificate

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C359S822000, C359S827000, C355S053000

Reexamination Certificate

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07061698

ABSTRACT:
In the case of a lens system (1), in particular in the case of a projection lens system for semiconductor lithography, it is possible to exchange at least one optical element, in particular the final optical element in the beam direction in the form of an end plate (3). For adjusting the exchangeable optical element (3), an optical quality fit with a fitting surface (6) is set between the optical element (3) and a mount (5) or a part connected to a mount (5).

REFERENCES:
patent: 4295721 (1981-10-01), Rebikoff
patent: 5052782 (1991-10-01), Myer
patent: 5926326 (1999-07-01), Fischer et al.
patent: 5973863 (1999-10-01), Hatasawa et al.
patent: 6014455 (2000-01-01), Sumiyoshi et al.
patent: 6400516 (2002-06-01), Spinali
Chapter 40, entitled Optical Fabrication, by Robert E. Parks, from the Handbook of Optics, Vol. I, Fundamentals, Techniques, and Design, Second Edition, published by McGraw Hill, Inc., Sep. 1994.

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