Lens scatterometer system employing source light beam scanning m

Optics: measuring and testing – Of light reflection

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356446, G01N 2147, G01B 1102

Patent

active

057036926

ABSTRACT:
An optical scatterometer system enables illumination of a sample material at various angles of incidence without rotating or otherwise moving the sample material.

REFERENCES:
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patent: 4806018 (1989-02-01), Falk
patent: 5241369 (1993-08-01), McNeil et al.
Murnane, Michael R. et al., "Developed PHotoresist Metrology Using Scatterometry," Proceeding of the SPIE, Integrated Circuit Metrology, Inspection, and Process Control VIII, vol. 2196, pp. 47-59 (1994).
Murnane, Michael R. et al., "Scattrometry for 0.24um-0.70um Developed Photoresist Metrology, " Proceedings of the SPIE, Integrated Circuit Metrology, Inspection, and Process Control IX, vol. 2439, pp. 427-436 (1995).

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